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Новости Hermes-me.Com
New Thin-Film Solar Cell Plant in Sakai
20:59 - 10 мая 2008 года Sharp Corporation has made a total capital investment of approximately 72 billion yen to build a thin-film solar cell plant in Sakai, Osaka Prefecture that is capable of boosting annual production up to a scale of 1 GW per year. Production will begin by March 2010 with a 480 MW initial production capacity for solar cells. Combined with the 160 MW capacity of the Katsuragi Plant (Nara Prefecture), this will expand Sharp’s global total production
capacity for thin-film solar cells to 1 GW in April 2010.
The market for solar cells is expected to expand rapidly. And as the number of large-scale
solar power generation systems around the world increases, it is said that solar power will
become a staple of renewable energy in the future.
With the introduction of the new manufacturing facility in the Sakai Plant that utilizes
large-size glass substrates, jointly developed together with Tokyo Electron Limited, Sharp
will dramatically improve production efficiency and be able to respond more efficiently to
booming demand. The Sakai Plant will also serve as a model for thin-film solar cell plants to
be developed around the world.
Main Features of the New Thin-Film Solar Cell Plant in Sakai
1. Manufacturing complex for the 21st century
Through horizontal deployment of TFT LCD thin-film technology, a cutting-edge LCD panel
plant and a thin-film solar cell plant will be established next to each other, allowing
infrastructure facilities and materials manufacturing plants, etc., to all be concentrated
within the same manufacturing complex.
2. Enlarging glass substrate size
Production efficiency will be improved through the enlargement of the glass substrate size
to 1,000 x 1,400 mm, which is approximately 2.7 times larger than the area of previous
substrates (560 x 925 mm).
Solar Cell Plant Overview
Location: Sakaihama District of Sakai City, Osaka Prefecture
Production item: Thin-film silicon solar cells
Plant scale: 1 GW
Initial production capacity: 480 MW
Investment: Approximately 72 billion yen
Start of operations: By March 2010
Glass substrate size: 1,000 x 1,400 mm
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